Atmospheric Plasma Spray (APS)

Atmospheric Plasma Spray, referred to as plasma spraying, constitutes a thermal spray process specifically suited for the deposition of metallic and ceramic materials. The process utilizes a high-enthalpy plasma jet generated by a plasma torch, which achieves a core temperature of up to 20,000°C. This thermal energy is sufficient to melt feedstock materials with high melting points, including ceramics. The feedstock powder is introduced into the plasma plume at the nozzle outlet via precision injectors. During transit to the substrate, the particles undergo simultaneous acceleration and thermal transfer, impacting the component surface with high kinetic energy and temperature. This results in the formation of a functional layer with specific corrosion and/or wear resistance characteristics.

CTS2000 Plasma System Platform

The CTS2000 plasma systems integrate advanced automation architectures based on Siemens TIA Portal or Mitsubishi GX Works engineering frameworks. The human-machine interface (HMI) is designed for operational simplicity, employing an intuitive operator workflow that ensures high user acceptance from initial commissioning.

System construction adheres to current industrial safety standards. Closed-loop process control is achieved through continuous parameter monitoring via high-precision sensor arrays and controllers, providing exceptional quality assurance throughout the coating cycle. An Advanced Remote Interface facilitates extensive bidirectional data communication between the plasma system and ancillary robotic or handling systems.

Each CTS plasma system is engineered to customer-specific specifications. A configurable data acquisition (datalogger) system enables the recording of all critical spray and process parameters for the entire duration of a component-specific coating run. This ensures full traceability and protects components from process deviations during coating.

大气层等离子体喷溅(APS)

大气层等离子体喷射，被称为等离子体喷射是一个热喷洒过程中具体而言适用于将应用程序的金属和陶瓷材料。 该过程使用的高-热等离子体喷射产生的等离子焰炬，它提供了一个核心温度高达20,000°C。这种热能量足以融化的原材料的熔点高，包括陶瓷。 最初的粉末是引入等离子体羽流在喷嘴出口使用精密的喷射器。 在运输过程的基体，颗粒同时加速和传送的热量，影响到该部件的表面与高动能量和温度。 这导致形成一个功能层与特定的腐蚀和/或耐磨性的特点。

CTS2000系统平台等离子体

CTS2000等离子系统集成了先进的自动化架构的基础上，西门子TIA的门户网站或三菱GX工作的工程的平台。 人类-机器的接口(人机)设计为便于操作，使用一个操作直观的工作流程，以确保高度的用户核准从目前的初始试运行。

系统的设计符合目前工业安全标准。 闭循环过程的控制是通过连续监测参数使用高精密传感器阵列和控制，它提供了特殊的质量保证整个涂料循环。 先进的远程接口，便于广泛的双向传送数据之间的等离子系统和辅助机器人或控制系统。

每个CTS等离子系统的设计是为了满足客户的具体规格。 一个自定义的数据采集系统(数据记录器)可以让你记录的所有重要的喷雾和工艺参数的整个涂料循环的具体组成部分。 这将确保完全可追踪性和保护组从技术上的差期间的涂层的应用。